The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes

Published:2024-07-16 Issue:29 Volume:15 Page:7496-7501
ISSN:1948-7185
Container-title:The Journal of Physical Chemistry Letters
language:en
Short-container-title:J. Phys. Chem. Lett.

Author:

Tezsevin I.¹^ORCID,Deijkers J. H.¹^ORCID,Merkx M. J. M.¹^ORCID,Kessels W. M. M.¹^ORCID,Sandoval T. E.²^ORCID,Mackus A. J. M.¹^ORCID

Affiliation:

1. Department of Applied Physics and Science Education, Eindhoven University of Technology, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

2. Department of Chemical and Environmental Engineering, Universidad Técnica Federico Santa María, 2340000 Santiago, Chile

Funder

H2020 European Research Council

Fondo Nacional de Desarrollo Cient?fico y Tecnol?gico

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

SURF Cooperative

Publisher

American Chemical Society (ACS)

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpclett.4c01632

Reference47 articles.

1. Atomic layer epitaxy

2. Atomic layer deposition (ALD): from precursors to thin film structures

3. The use of atomic layer deposition in advanced nanopatterning

4. Atomic Layer Deposition: An Overview

5. A brief review of atomic layer deposition: from fundamentals to applications

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP