Functional model for analysis of ALD nucleation and quantification of area-selective deposition
Author:
Affiliation:
1. Department of Chemical and Biomolecular Engineering, North Carolina State University, Raleigh, North Carolina 27695
Funder
National Science Foundation
Semiconductor Research Corporation
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5054285
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