Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Author:
Funder
Dutch Research Council
Lam Research Corp
European Research Council
Agencia Nacional de Investigación y Desarrollo
Publisher
Elsevier BV
Reference66 articles.
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4. Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition;Yarbrough;J. Vac. Sci. Technol. A,2021
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. An Atomistic Picture of Buildup and Degradation Reactions in Area-Selective Atomic Layer Deposition with a Small Molecule Inhibitor;Chemistry of Materials;2024-07-31
2. The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes;The Journal of Physical Chemistry Letters;2024-07-16
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