Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography

Author:

Lodha Jayant K.,Pollentier Ivan,Conard Thierry,Vallat Remi,De Gendt Stefan,Armini Silvia

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference60 articles.

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