Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms-Reference-Cited by-同舟云学术

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Semiconductor Nanowire Fabrication by Bottom-Up and Top-Down Paradigms

Published:2012-05-02 Issue:11 Volume:24 Page:1975-1991
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Hobbs Richard G.¹²,Petkov Nikolay¹³,Holmes Justin D.¹²

Affiliation:

1. Materials Chemistry & Analysis Group, Department of Chemistry and the Tyndall National Institute, University College Cork, Cork, Ireland

2. Centre for Research on Adaptive Nanostructures and Nanodevices (CRANN), Trinity College Dublin, Dublin 2, Ireland

3. Electron Microscopy and Analysis Facility (EMAF), Tyndall National Institute, Lee Maltings, Prospect Row, Ireland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm300570n

Reference231 articles.

1. Synthesis and applications of one-dimensional semiconductors

2. Functional Nanowires

3. Nanoscale avalanche photodiodes for highly sensitive and spatially resolved photon detection

4. Large-scale, heterogeneous integration of nanowire arrays for image sensor circuitry

5. Nanowire Photodetectors

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