In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique

Author:

Gao Xinshuang,Zhang Hongru,Li Shi,Wang Luya,Dai Xingang,Hu Yanjun,Xu Junquan,Jing Gaoshan,Fan GuofangORCID

Funder

National Key Research and Development Program of China

Publisher

Elsevier BV

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1. Thickness measurement of thin films using atomic force microscopy based scratching;Surface Topography: Metrology and Properties;2024-06-01

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