Next generation nanopatterning using small molecule inhibitors for area-selective atomic layer deposition
Author:
Affiliation:
1. Department of Chemical Engineering, Stanford University, Stanford 94305, California
Funder
Merck KGaA
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
https://avs.scitation.org/doi/pdf/10.1116/6.0000840
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4. Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation;Applied Surface Science;2024-08
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