Si precursor inhibitors for area selective deposition of Ru-Reference-Cited by-同舟云学术

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Si precursor inhibitors for area selective deposition of Ru

Published:2024-10 Issue: Volume:669 Page:160530
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Gu Bonwook^ORCID,Yasmeen Sumaira^ORCID,Oh Geun-Ha^ORCID,Oh Il-Kwon^ORCID,Kang Youngho,Lee Han-Bo-Ram^ORCID

Publisher

Elsevier BV

Reference47 articles.

1. Atomic layer deposition: an overview;George;Chem. Rev.,2010

2. Recent advances in materials design using atomic layer deposition for energy applications;Gupta;Adv. Funct. Mater.,2022

3. Rational design of novel catalysts with atomic layer deposition for the reduction of carbon dioxide;Chen;Adv. Energy Mater.,2019

4. Atomic layer deposition for lithium-based batteries;Ma;Adv. Mater. Interfaces,2016

5. Atomic layer deposition of TiO2, ZrO2 and TiO2/ZrO2 mixed oxide nanofilms on PMMA for enhanced biomaterial functionalization;Shahmohammadi;Appl. Surf. Sci.,2022

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