Reductive Elimination of Hypersilyl Halides from Zinc(II) Complexes. Implications for Electropositive Metal Thin Film Growth-Reference-Cited by-同舟云学术

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Reductive Elimination of Hypersilyl Halides from Zinc(II) Complexes. Implications for Electropositive Metal Thin Film Growth

Published:2014-12-09 Issue:1 Volume:54 Page:7-9
ISSN:0020-1669
Container-title:Inorganic Chemistry
language:en
Short-container-title:Inorg. Chem.

Author:

Sirimanne Chatu T.¹,Kerrigan Marissa M.¹,Martin Philip D.¹,Kanjolia Ravindra K.²,Elliott Simon D.³,Winter Charles H.¹

Affiliation:

1. Department of Chemistry, Wayne State University, Detroit, Michigan 48202, United States

2. SAFC Hitech, 1429 Hilldale Avenue, Haverhill, Massachusetts 01832, United States

3. Tyndall National Institute, University College Cork, Lee Maltings, Cork, Ireland

Funder

Division of Chemistry

Science Foundation Ireland

Publisher

American Chemical Society (ACS)

Subject

Inorganic Chemistry,Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/ic502184f

Reference29 articles.

1. Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

2. Precursor design and reaction mechanisms for the atomic layer deposition of metal films

3. Metal ALD and pulsed CVD: Fundamental reactions and links with solution chemistry

4. Novel materials by atomic layer deposition and molecular layer deposition

5. Atomic Layer Deposition: An Overview

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3. Applications of Proton-Coupled Electron Transfer in Organic Synthesis;Chinese Journal of Organic Chemistry;2021

4. Classification of processes for the atomic layer deposition of metals based on mechanistic information from density functional theory calculations;The Journal of Chemical Physics;2017-02-07

5. Unprecedented solvent induced inter-conversion between monomeric and dimeric silylene–zinc iodide adducts;Dalton Transactions;2017

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