Classification of processes for the atomic layer deposition of metals based on mechanistic information from density functional theory calculations
Author:
Affiliation:
1. Tyndall National Institute, University College Cork, Lee Maltings, Dyke Parade, Cork T12 R5CP, Ireland
2. Chemistry and Chemical Biology, Rutgers University, 174 Frelinghuysen Road, Piscataway, New Jersey 08854, USA
Publisher
AIP Publishing
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4975085
Reference56 articles.
1. Crystallinity of inorganic films grown by atomic layer deposition: Overview and general trends
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5. Simulating the atomic layer deposition of alumina from first principles
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