Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2-Plasma
Author:
Affiliation:
1. COCOON Group, Department of Solid State Science, Ghent University, Ghent 9000, Belgium
2. AGH University of Krakow, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland
Funder
Narodowe Centrum Nauki
Fonds Wetenschappelijk Onderzoek
Bijzonder Onderzoeksfonds UGent
Publisher
American Chemical Society (ACS)
Subject
Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c07568
Reference63 articles.
1. Atomic Layer Deposition of Platinum Thin Films
2. Atomic layer deposition of platinum clusters on titania nanoparticles at atmospheric pressure
3. Low-Temperature Atomic Layer Deposition of Platinum Using (Methylcyclopentadienyl)trimethylplatinum and Ozone
4. Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques
5. Plasma-Enhanced ALD of Platinum with O2, N2and NH3Plasmas
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