Role of the Oxidizing Co-Reactant in Pt Growth by Atomic Layer Deposition Using MeCpPtMe3 and O2/O3/O2-Plasma
Author:
Affiliation:
1. COCOON Group, Department of Solid State Science, Ghent University, Ghent 9000, Belgium
2. AGH University of Krakow, Academic Centre for Materials and Nanotechnology, al. A. Mickiewicza 30, 30-059 Krakow, Poland
Funder
Narodowe Centrum Nauki
Fonds Wetenschappelijk Onderzoek
Bijzonder Onderzoeksfonds UGent
Publisher
American Chemical Society (ACS)
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.jpcc.3c07568
Reference63 articles.
1. Atomic Layer Deposition of Platinum Thin Films
2. Atomic layer deposition of platinum clusters on titania nanoparticles at atmospheric pressure
3. Low-Temperature Atomic Layer Deposition of Platinum Using (Methylcyclopentadienyl)trimethylplatinum and Ozone
4. Growth of continuous and ultrathin platinum films on tungsten adhesion layers using atomic layer deposition techniques
5. Plasma-Enhanced ALD of Platinum with O2, N2and NH3Plasmas
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