Atomic Layer Deposition of Platinum Thin Films-Reference-Cited by-同舟云学术

Atomic Layer Deposition of Platinum Thin Films

Published:2003-04-09 Issue:9 Volume:15 Page:1924-1928
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Aaltonen Titta¹,Ritala Mikko¹,Sajavaara Timo¹,Keinonen Juhani¹,Leskelä Markku¹

Affiliation:

1. Laboratory of Inorganic Chemistry, Department of Chemistry, P.O. Box 55, FIN-00014 University of Helsinki, Finland, and The Accelerator Laboratory, Department of Physical Sciences, P.O. Box 43, FIN-00014 University of Helsinki, Finland

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm021333t

Reference26 articles.

1. Nayak, M.; Ezhilvalavan, S.; Tseng, T. Y. InHandbook of Thin FilmMaterials; Nalwa, H. S., Ed.; Academic Press: San Diego, 2001; Vol. 3, pp 121−123.

2. Platinum Film Growth by Chemical Vapor Deposition Based on Autocatalytic Oxidative Decomposition

3. High-κ gate dielectrics: Current status and materials properties considerations

4. Low‐temperature organometallic chemical vapor deposition of platinum

5. Organometallic chemical vapor deposition of platinum. Reaction kinetics and vapor pressures of precursors

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