Precursor design and reaction mechanisms for the atomic layer deposition of metal films-Reference-Cited by-同舟云学术

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Precursor design and reaction mechanisms for the atomic layer deposition of metal films

Published:2013-12 Issue:23-24 Volume:257 Page:3271-3281
ISSN:0010-8545
Container-title:Coordination Chemistry Reviews
language:en
Short-container-title:Coordination Chemistry Reviews

Author:

Bernal Ramos Karla,Saly Mark J.,Chabal Yves J.

Funder

National Science Foundation

Texas Higher Education Coordinating Board NHARP Program

SAFC Hitech

Consejo Nacional de Ciencia y Tecnologia (CONACyT), Mexico

Publisher

Elsevier BV

Subject

Materials Chemistry,Physical and Theoretical Chemistry,Inorganic Chemistry

Reference157 articles.

1. (MeCp)Ir(CHD) and molecular oxygen as precursors in atomic layer deposition of iridium

2. Iridium Barriers for Direct Copper Electrodeposition in Damascene Processing

3. Properties of ultrathin platinum deposited by atomic layer deposition for nanoscale copper-metallization schemes

4. Atomic Layer Deposition of Ru Thin Films Using 2,4-(Dimethylpentadienyl)(ethylcyclopentadienyl)Ru by a Liquid Injection System

5. Plasma-Assisted Atomic Layer Deposition of Palladium

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1. The surface chemistry of the atomic layer deposition of ruthenium on aluminum and tantalum oxide surfaces;Surface Science;2024-11

2. Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements;Advanced Materials Interfaces;2024-08-23

3. Synthesis, characterization, volatility, and thermal stability of fluorinated copper(II) aminoalkoxide complexes as potential vapour deposition precursors;Canadian Journal of Chemistry;2024-08-20

4. Enhanced nucleation mechanism in ruthenium atomic layer deposition: Exploring surface termination and precursor ligand effects with RuCpEt(CO)2;Journal of Vacuum Science & Technology A;2024-08-16

5. Compounds with Chelating 3-Dimethylamino-1-propyl Ligands as Chemical Vapor Deposition Precursors. Synthesis and Characterization of M[(CH₂)₃NMe₂]₂ Complexes of Nickel(II), Palladium(II), and Platinum(II);Organometallics;2024-07-02

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