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Plasma-Assisted Atomic Layer Deposition of Palladium

  • Published:2005-01 Issue:1 Volume:11 Page:60-66
  • ISSN:0948-1907
  • Container-title:Chemical Vapor Deposition
  • language:en
  • Short-container-title:Chem. Vap. Deposition

Author:

Ten Eyck G. A.,Senkevich J. J.,Tang F.,Liu D.,Pimanpang S.,Karaback T.,Wang G.-C.,Lu T.-M.,Jezewski C.,Lanford W. A.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Cited by 65 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Flexible printed three dimensional (3D) integrated carbon nanotube complementary metal oxide semiconductor (CMOS) thin film transistors and circuits;Science China Information Sciences;2024-08-08

2. Area-selective atomic layer deposition of palladium;Journal of Vacuum Science & Technology A;2024-01-24

3. Atomic layer deposition (ALD) of palladium: from processes to applications;Critical Reviews in Solid State and Materials Sciences;2023-11-15

4. Selective Deposition of PdO Nanoparticles on Si Nanodevices for Hydrogen Sensing;ACS Applied Nano Materials;2023-06-02

5. Atomic layer deposition thin film techniques and its bibliometric perspective;The International Journal of Advanced Manufacturing Technology;2023-05-05
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