(tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors-Reference-Cited by-同舟云学术

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(tBuN)SiMe2NMe2—A new N,N′-κ2-monoanionic ligand for atomic layer deposition precursors

Published:2021-05 Issue:3 Volume:39 Page:032409
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A
language:en
Short-container-title:Journal of Vacuum Science & Technology A

Author:

Griffiths Matthew B. E.¹^ORCID,Zanders David¹²^ORCID,Land Michael A.¹^ORCID,Masuda Jason D.³^ORCID,Devi Anjana²^ORCID,Barry Seán T.¹^ORCID

Affiliation:

1. Department of Chemistry, Carleton University, 1125 Colonel By Drive, Ottawa, Ontario K1S 5B6, Canada

2. Inorganic Materials Chemistry, Faculty of Chemistry and Biochemistry, Ruhr University Bochum, Universitätsstraße 150, Bochum 44780, Germany

3. Department of Chemistry, Saint Mary’s University, 923 Robie Street, Halifax, Nova Scotia B3H 3C3, Canada

Funder

Natural Sciences and Engineering Research Council of Canada

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

https://avs.scitation.org/doi/pdf/10.1116/6.0000795

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. An Unusual Tri‐coordinate Co(II) Silylamide with Potential for Chemical Vapor Deposition Processes;Zeitschrift für anorganische und allgemeine Chemie;2022-10-05

2. Ferromagnetic Cobalt Disulfide: A CVD Pathway Toward High-Quality and Phase-Pure Thin Films;ACS Applied Electronic Materials;2022-07-21

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