Synthesis and characterization of mist chemical vapor deposited aluminum titanium oxide films
Author:
Funder
Japan Society for the Promotion of Science
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Link
http://iopscience.iop.org/article/10.7567/1347-4065/ab29e3/pdf
Reference36 articles.
1. High dielectric constant gate oxides for metal oxide Si transistors
2. Surface passivation of GaN and GaN/AlGaN heterostructures by dielectric films and its application to insulated-gate heterostructure transistors
3. Hybrid titanium–aluminum oxide layer as alternative high-k gate dielectric for the next generation of complementary metal–oxide–semiconductor devices
4. Thermal stability and electrical properties of titanium-aluminum oxide ultrathin films as high-k gate dielectric materials
5. Electrical characterization of AlxTiyOz mixtures and Al2O3–TiO2–Al2O3 nanolaminates
Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Mist chemical vapor deposited-gate insulators for GaN-based MIS devices applications;2022 IEEE International Meeting for Future of Electron Devices, Kansai (IMFEDK);2022-11-28
2. Effect of hydrochloric acid addition on dielectric properties of solution-processed aluminum titanium oxide thin film annealed at low temperature;Thin Solid Films;2022-07
3. Mist chemical vapor deposition of Al1−xTixOy thin films and their application to a high dielectric material;Journal of Applied Physics;2022-03-14
4. Normally-off operations in partially-gate-recessed AlTiO/AlGaN/GaN field-effect transistors based on interface charge engineering;Journal of Applied Physics;2021-07-07
5. Comparison of high-k Y2O3/TiO2 bilayer and Y-doped TiO2 thin films on Ge substrate;Journal of Physics D: Applied Physics;2021-02-22
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3