Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference19 articles.
1. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
2. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
3. Frequency coupling in dual frequency capacitively coupled radio-frequency plasmas
4. Heating of a dual frequency capacitively coupled plasma via the plasma series resonance
5. The role of the relative voltage and phase for frequency coupling in a dual-frequency capacitively coupled plasma
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