On the electrical asymmetry effect in large area multiple frequency capacitively coupled plasmas
Author:
Publisher
IOP Publishing
Subject
Surfaces, Coatings and Films,Acoustics and Ultrasonics,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
http://stacks.iop.org/0022-3727/47/i=6/a=065201/pdf
Reference26 articles.
1. Dual frequency capacitive plasmas in Fe and Ni sputter applications: correlation of discharge properties on thin film properties
2. Nonlinear dynamics of radio frequency plasma processing reactors powered by multifrequency sources
3. Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
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