Langmuir Probe Measurements in a Dual-Frequency Capacitively Coupled rf Discharge-Reference-Cited by-同舟云学术

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Langmuir Probe Measurements in a Dual-Frequency Capacitively Coupled rf Discharge

Published:2024-04 Issue:4 Volume:52 Page:1346-1357
ISSN:0093-3813
Container-title:IEEE Transactions on Plasma Science
language:
Short-container-title:IEEE Trans. Plasma Sci.

Author:

Schleitzer Jessica¹^ORCID,Schneider Viktor¹^ORCID,Korolov I.²^ORCID,Hübner G.²,Hartmann P.³^ORCID,Schulze J.²^ORCID,Kersten Holger¹^ORCID

Affiliation:

1. Institute of Experimental and Applied Physics, University of Kiel, Kiel, Germany

2. Chair of Applied Electrodynamics and Plasma Technology, Faculty of Electrical Engineering and Information Sciences, Ruhr University Bochum, Bochum, Germany

3. Institute for Solid State Physics and Optics, Wigner Research Centre for Physics, Budapest, Hungary

Funder

German Research Foundation (DFG, Deutsche Forschungsgemeinschaft) in the frame of Project

Collaborative Research Center SFB (Sonderforschungsbereich) 1316, project A4

National Office for Research, Development and Innovation

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Link

http://xplorestaging.ieee.org/ielx7/27/10568413/10498099.pdf?arnumber=10498099

Reference53 articles.

1. Plasma etching: Yesterday, today, and tomorrow

2. Plasma cleaning of surfaces;Belkind;Vac. Coating Technol.,2008

3. Effect of ion energies on the film properties of titanium dioxides synthesized via plasma enhanced atomic layer deposition

4. Improvement of ZnO TCO film growth for photovoltaic devices by reactive plasma deposition (RPD)

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