Ultra Thin TiN Films Prepared by an Advanced Ion-Plating Method
Author:
Affiliation:
1. R&D Center, ShinMaywa Industries, Ltd.
2. Hitachi Research Laboratory, Hitachi, Ltd.
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/41/9/41_9_1161/_pdf
Reference8 articles.
1. 1) J.-E. Sundgren, B.-O. Johansson, S.-E. Karlsson and H. T. G. Hentzell: Thin Solid Films, 105 (1983), 367–384.
2. 2) H. Randhawa: J. Vac. Sci. Technol., A4 (1986), 2755–2758.
3. 3) A. Mumtaz and W. H. Class: J. Vac. Sci. Technol., 20(3) (1982), 345–348.
4. 4) M. Kiuchi and A. Chayahara: Appl. Phys. Letts., 64 (1994), 1048–1049.
5. 5) Japanese patent, No. 1560327.
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