Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure-Reference-Cited by-同舟云学术

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Mechanisms of reactive sputtering of titanium nitride and titanium carbide II: Morphology and structure

Published:1983-07 Issue:4 Volume:105 Page:367-384
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Sundgren J.-E.,Johansson B.-O.,Karlsson S.-E.,Hentzell H.T.G.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference49 articles.

1. Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

2. Mass Spectrometric Analysis in RF Reactive Sputtering Discharge

3. Mechanism of rf reactive sputtering

4. Hard decorative TiN coatings by ion plating

5. Reactively sputtered TiN coatings for tribological applications

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