Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition-Reference-Cited by-同舟云学术

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Mechanisms of reactive sputtering of titanium nitride and titanium carbide I: Influence of process parameters on film composition

Published:1983-07 Issue:4 Volume:105 Page:353-366
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Sundgren J.-E.,Johansson B.-O.,Karlsson S.-E.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Residual compressive stress in sputter-deposited TiC films on steel substrates

2. Deposition of Ti-N compounds by thermionically assisted triode reactive ion plating

3. TiN coatings on steel

4. Friction and adhesive wear of titanium carbide and titanium nitride overlay coatings

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1. Investigations of TiC and SiC films synthesized by DC magnetron sputtering and thermal annealing;Proceedings of the Institution of Mechanical Engineers, Part E: Journal of Process Mechanical Engineering;2024-01-09

2. Bipolar high‐power impulse magnetron sputtering synthesis of high‐entropy carbides;Journal of the American Ceramic Society;2022-02-14

3. Morphological and Compositional Studies on Al/Ti/TiN/Si, Al/TiN/Si, Al/W/Si, Al/WN/Si Systems to Test the Diffusion Barrier Properties of Nanoscale-Thick Layers between Al and Si;Micromachines;2021-07-21

4. Synthesis and study of highly dense and smooth TiN thin films;Materials Chemistry and Physics;2021-07

5. A comparative investigation of hetero-epitaxial TiC thin films deposited by magnetron sputtering using either hybrid DCMS/HiPIMS or reactive DCMS process;Applied Surface Science;2021-01

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