Secondary Electron Emission Characteristics of MgO Thin Films Prepared by an Advanced Ion-Plating Method-Reference-Cited by-同舟云学术

Secondary Electron Emission Characteristics of MgO Thin Films Prepared by an Advanced Ion-Plating Method

Published:2001 Issue:9 Volume:42 Page:1870-1873
ISSN:1345-9678
Container-title:MATERIALS TRANSACTIONS
language:en
Short-container-title:Mater. Trans.

Author:

Uetani Kazuo¹,Kajiyama Hiroshi²³,Kato Akira²,Takagi Akiko⁴,Hori Takanobu¹,Tokomoto Isao¹,Koizumi Yasuhiro¹,Nose Koichi¹,Ihara Yasushi²,Onisawa Ken-ichi²,Minemura Tetsuroh²

Affiliation:

1. R&D Center, ShinMaywa Industries, Ltd.

2. Hitachi Research Laboratory, Hitachi, Ltd.

3. Graduate School of Engineering, Ibaraki University

4. Graduate Student, Ibaraki University

Publisher

Japan Institute of Metals

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.jstage.jst.go.jp/article/matertrans/42/9/42_9_1870/_pdf

Reference8 articles.

1. 1) H. Uchiike, K. Miura, N. Nakayama, T. Shinoda and Y. Fukuyama: IEEE Trans. Electron Devices ED-23 (1976) 1211–1217.

2. 2) Japanese patent, No. 1560327.

3. 3) K. Uetani, H. Kajiyama, A. Kato, A. Takagi, I. Tokomoto, Y. Koizumi, K. Nose, Y. Ihara, K. Onisawa and T. Minemura: Mater. Trans. 42 (2001) 411–413.

4. 4) K. Uetani, H. Kajiyama, A. Kato, I. Tokomoto, Y. Koizumi, K. Nose, Y. Ihara, K. Onisawa and T. Minemura: Mat. Res. Soc. Symp. Proc. 647 (2001) O11.33.1-O11.33.6.

5. 5) K. Uetani, H. Kajiyama, T. Yamaguchi, K. Nose, K. Onisawa and T. Minemura: Mater. Trans., JIM 41 (2000) 1161–1163.

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