Oxidation Mechanism of Ultra Thin TiN Films Prepared by an Advanced Ion-plating Method-Reference-Cited by-同舟云学术

Oxidation Mechanism of Ultra Thin TiN Films Prepared by an Advanced Ion-plating Method

Published:2001 Issue:3 Volume:42 Page:403-406
ISSN:1345-9678
Container-title:MATERIALS TRANSACTIONS
language:en
Short-container-title:Mater. Trans.

Author:

Uetani Kazuo¹,Kajiyama Hiroshi²³,Takagi Akiko,Tokomoto Isao¹,Koizumi Yasuhiro¹,Nose Koichi¹,Ihara Yasushi¹,Kato Akira²,Onisawa Ken-ichi²,Minemura Tetsuroh²

Affiliation:

1. R&D Center, ShinMaywa Industries, Ltd.

2. Hitachi Research Laboratory, Hitachi, Ltd.

3. Graduate Student, Ibaraki University

Publisher

Japan Institute of Metals

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.jstage.jst.go.jp/article/matertrans/42/3/42_3_403/_pdf

Reference12 articles.

1. 1) H. Randhawa: J. Vac. Sci. Technol. A4 (1986) 2755–2758.

2. 2) A. Muntaz and W. H. Class: J. Vac. Sci. Technol. 20 (1982) 345–348.

3. 3) M. A. Nicolet: Thin Solid Films 52 (1978) 415–443.

4. 4) Japanese patent, No. 1560327.

5. 5) K. Uetani, H. Kajiyama, T. Yamaguchi, K. Nose, K. Onisawa and T. Minemura: Mater. Trans. JIM 41 (2000) 1161–1163.

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