Ion-Plating Deposition of MgO Protective Layer for AC-Plasma Display Panels

Abstract

AbstractMgO thin films as a protective layer in plasma display panels (PDPs) were deposited by an advanced ion-plating (AIP) apparatus that we had developed. The AIP method enables plasma operation at low-pressures of 10−3 Pa. The MgO thin films were mainly (111) oriented with a small amount of randomly oriented textures. The preferred orientation of the films was dependent on deposition conditions; oxygen content and substrate temperature. Fine columnar structures grew with sharp apexes at the film surface. Secondary electron emission coefficient from a film deposited by the AIP method was higher than that by a conventional electron beam evaporation method. The MgO protective layer could be expected to improve PDPs by our AIP deposition.