Middle-of-the-Line Reliability Characterization of Recessed-Diffusion-Contact Adopted sub-5nm Logic Technology
Author:
Affiliation:
1. Samsung Foundry Business, Samsung Electronics,Yong-in si,Republic of Korea
Publisher
IEEE
Link
http://xplorestaging.ieee.org/ielx7/9764406/9764408/09764599.pdf?arnumber=9764599
Reference20 articles.
1. Device Exploration of NanoSheet Transistors for Sub-7-nm Technology Node
2. A novel multibridge-channel MOSFET (MBCFET): fabrication technologies and characteristics
3. Sub-25nm single-metal gate CMOS multi-bridge-channel MOSFET (MBCFET) for high performance and low power application
4. High Drive and Low Leakage Current MBC FET with Channel Thickness 1.2nm/0.6nm
5. A 22nm high performance and low-power CMOS technology featuring fully-depleted tri-gate transistors, self-aligned contacts and high density MIM capacitors
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