4H-SiC Growth from Si-Cr-C Solution under Al and N Co-Doping Conditions

Author:

Mitani Takeshi1,Komatsu Naoyoshi1,Takahashi Tetsuo1,Kato Tomohisa1,Ujihara Toru2,Matsumoto Yuji3,Kurashige Kazuhisa1,Okumura Hajime1

Affiliation:

1. RandD Partnership for Future Power Electronics Technology (FUPET)

2. Nagoya University

3. Tohoku University

Abstract

We have investigated the solution growth under various Al-N co-doping conditions. Both p-type and n-type 4H-SiC were successfully grown under Al-N co-doping conditions, while using the effect of Al-addition to stabilize both growth surface and polytype. The doping and electrical properties were investigated systematically. Interaction between Al and N in the incorporation process and electrical property under heavily co-doped conditions were discussed.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

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