Affiliation:
1. Intel assignee to SEMATECH
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference86 articles.
1. [1] EUV Lithography, Vivek Bakshi ed., SPIE, Press, ISBN, 9780819469649, (2008)
2. [2] H. Meiling et al.,EUV system: moving toward production, Proc. SPIE, 7271, 727102 (2009)
3. [3] B. Icard, et al., Development of resist process for 5-KV multi-beam technology, Proc. SPIE, 7271, 72710R (2009)
4. [4] C. Klein, et al., PML2: the maskless multibeam solution for the 22nm node and beyond, Proc. SPIE, 7271, 72710N (2009)
5. [5] P. Petric et al., REBL nanowriter: Reflective Electron Beam Lithography, Proc. SPIE, 7271, 727107 (2009)
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