EUVL system: moving towards production-Reference-Cited by-同舟云学术

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EUVL system: moving towards production

Published:2009-03-13 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Alternative Lithographic Technologies
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Author:

Meiling Hans,Buzing Nico,Cummings Kevin,Harned Noreen,Hultermans Bas,de Jonge Roel,Kessels Bart,Kürz Peter,Lok Sjoerd,Lowisch Martin,Mallman Joerg,Pierson Bill,Wagner Christian,van Dijk Andre,van Setten Eelco,Zimmerman John

Publisher

SPIE

Cited by 23 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 4K Detectors Array for On-Wafer EUV Imaging in Lithography Control Beyond 5-nm Node;IEEE Transactions on Electron Devices;2023-11

2. Characteristics of laser induced discharge tin plasma and its extreme ultraviolet radiation;Frontiers of Optoelectronics;2020-04-14

3. Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering;SPIE Proceedings;2015-09-24

4. Photoluminescence-based detection of particle contamination on extreme ultraviolet reticles;Review of Scientific Instruments;2015-06

5. Evaluation of lithographic performance of extreme ultra violet mask using coherent scattering microscope;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2012-11

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