Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering-Reference-Cited by-同舟云学术

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Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering

Published:2015-09-24 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
language:
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Author:

Haase Anton,Soltwisch Victor,Scholze Frank,Braun Stefan

Publisher

SPIE

Reference14 articles.

1. EUV multilayer optics;Feigl,2006

2. EUVL system: moving towards production;Meiling,2009

3. Mo/Si Multilayers with Different Barrier Layers for Applications as Extreme Ultraviolet Mirrors

4. Characterization of the PTB EUV reflectometry facility for large euvl optical components;Tümmler,2003

5. Nonspecular x-ray reflection from rough multilayers

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2. Ultrafast laser-induced strain waves in thin ruthenium layers;Optics Express;2021-09-21

3. Inhibition of chemical interaction of molybdenum and silicon in a Mo/Si multilayer structure by the formation of intermediate compounds;Physical Chemistry Chemical Physics;2021

4. Study of Interfaces of Mo/Be Multilayer Mirrors Using X-ray Photoelectron Spectroscopy;The Journal of Physical Chemistry C;2019-10-03

5. Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems;Physical Chemistry Chemical Physics;2019

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