Author:
Klein C.,Platzgummer E.,Klikovits J.,Piller W.,Loeschner H.,Bejdak T.,Dolezel P.,Kolarik V.,Klingler W.,Letzkus F.,Butschke J.,Irmscher M.,Witt M.,Pilz W.,Jaschinsky P.,Thrum F.,Hohle C.,Kretz J.,Nogatch J. T.,Zepka A.
Cited by
5 articles.
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1. Stitch-Aware Routing Considering Smart Boundary for Multiple E-Beam Lithography;2020 International Symposium on VLSI Design, Automation and Test (VLSI-DAT);2020-08
2. Stitch-Aware Routing for Multiple E-Beam Lithography;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2015-03
3. Feasibility study of optical/e-beam complementary lithography;Alternative Lithographic Technologies IV;2012-03-01
4. Optical maskless lithography;Russian Microelectronics;2011-11
5. Extension Options for 193nm Immersion Lithography;Journal of Photopolymer Science and Technology;2009