Fundamental study of placement errors in directed self-assembly-Reference-Cited by-同舟云学术

Fundamental study of placement errors in directed self-assembly

Published:2014-07-25 Issue:3 Volume:13 Page:033005
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Wuister Sander F.¹,Ambesi Davide¹,Druzhinina Tamara S.¹,Peeters Emiel²,Finders Jo¹,Wolterink Joanne Klein³,Fraaije Johannes G. E. M. (Hans)⁴

Affiliation:

1. ASML De Run 6501, Veldhoven 5504DR, The Netherlands

2. Philips Group Innovation, Research, Department of Applied Chemical Technology, High Tech Campus 7, 5656AE Eindhoven, The Netherlands

3. Culgi B.V. P.O. Box 252, AG Leiden 2300, The Netherlands

4. Culgi B.V. P.O. Box 252, AG Leiden 2300, The NetherlandsdLeiden University, Leiden Institute of Chemistry, Soft Matter Chemistry Group, P.O. Box 9502, RA Leiden 2300, The Netherlands

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference31 articles.

1. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

2. Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

3. Advanced Materials

4. Orientation-Controlled Self-Assembled Nanolithography Using a Polystyrene−Polydimethylsiloxane Block Copolymer

5. Graphoepitaxy of Self-Assembled Block Copolymers on Two-Dimensional Periodic Patterned Templates

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