Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist
Author:
Affiliation:
1. IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120
2. IBM Albany Nanotech, 257 Fuller Road, Albany, New York 12203
3. Present address: IBM T.J. Watson Research Center, 1101 Kitchawan Road, Yorktown Heights, New York 10598
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/nn100686v
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