Placement error in directed self-assembly of block copolymers for contact hole application-Reference-Cited by-同舟云学术

Placement error in directed self-assembly of block copolymers for contact hole application

Published:2016-04-27 Issue:2 Volume:15 Page:021407
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Bouanani Shayma¹,Tiron Raluca²,Bos Sandra²,Gharbi Ahmed²,Barros Patricia Pimenta²,Hazart Jérôme²,Robert Frédéric³,Lapeyre Céline¹,Ostrovsky Alain³,Monget Cédric³

Affiliation:

1. STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles Cedex, FrancebCEA-LETI, MINATEC Campus, 17 Rue des Martyrs, 38054 Grenoble, France

2. CEA-LETI, MINATEC Campus, 17 Rue des Martyrs, 38054 Grenoble, France

3. STMicroelectronics, 850 Rue Jean Monnet, 38926 Crolles Cedex, France

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications

2. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

3. Integration of block copolymer directed assembly with 193 immersion lithography

4. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

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1. Dual brush process for selective surface modification in graphoepitaxy directed self-assembly;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-08-21

2. Via patterning in the 7-nm node using immersion lithography and graphoepitaxy directed self-assembly;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-06-14

3. Metrology and inspection required for next generation lithography;Japanese Journal of Applied Physics;2017-04-24

4. Nanopatterning via Solvent Vapor Annealing of Block Copolymer Thin Films;Chemistry of Materials;2016-09-30