Challenges and opportunities in applying grapho-epitaxy DSA lithography to metal cut and contact/via applications
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SPIE
Reference4 articles.
1. Frequency multiplication of lamellar phase block copolymers with grapho-epitaxy directed self-assembly sensitivity to prepattern
2. Flexible Control of Block Copolymer Directed Self-Assembly using Small, Topographical Templates: Potential Lithography Solution for Integrated Circuit Contact Hole Patterning
3. Simulations of the morphology of cylinder-forming asymmetric diblock copolymer thin films on nanopatterned substrates;Wang,2003
4. Physical verification and manufacturing of contact/via layers using grapho-epitaxy DSA processes;Andres Torres,2014
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