Novel EUV mask absorber evaluation in support of next-generation EUV imaging-Reference-Cited by-同舟云学术

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

Published:2018-10-10 Issue: Volume: Page:
ISSN:
Container-title:Photomask Technology 2018
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Author:

Detavernier Christophe,Philipsen Vicky,Luong Vu,Opsomer Karl,Erdmann Andreas,Evanschitzky Peter,Scholze Frank,Laubis Christian,van de Kruijs Robbert W. E.,Heidarnia-Fathabad Zahra,Hendrickx Eric

Publisher

SPIE

Reference26 articles.

1. Reducing extreme ultraviolet mask three-dimensional effects by alternative metal absorbers

2. Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?;Erdmann;Journal of Micro/Nanolithography, MEMS, and MOEMS,2018

3. Modeling studies on alternative EUV mask concepts for higher NA;Erdmann,2013

4. Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

5. Mitigation of mask three-dimensional induced phase effects by absorber optimization in ArFiand extreme ultraviolet lithography

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