Imaging validation for LS of dark field low-n vs Ta-based absorber masks-Reference-Cited by-同舟云学术

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Imaging validation for LS of dark field low-n vs Ta-based absorber masks

Published:2023-11-21 Issue: Volume: Page:
ISSN:
Container-title:International Conference on Extreme Ultraviolet Lithography 2023
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Author:

Kovalevich Tatiana,Van Look Lieve,Moussa Alain,Franke Joern-Holger,Philipsen Vicky

Publisher

SPIE

Reference11 articles.

1. Alternative reticles for low-k1 euv imaging;Van Lare,2019

2. Mask-absorber optimization: the next phase

3. Reducing EUV mask 3D effects by alternative metal absorbers

4. Novel euv mask absorber evaluation in support of next-generation euv imaging;Philipsen,2018

5. Evaluation of lines and spaces printing and general understanding of imaging with dark field low-n mask;Kovalevich;J Micro Nanolithogr MEMS MOEMS,2023

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