Author:
Kovalevich Tatiana,Van Look Lieve,Moussa Alain,Franke Joern-Holger,Philipsen Vicky
Reference11 articles.
1. Alternative reticles for low-k1 euv imaging;Van Lare,2019
2. Mask-absorber optimization: the next phase
3. Reducing EUV mask 3D effects by alternative metal absorbers
4. Novel euv mask absorber evaluation in support of next-generation euv imaging;Philipsen,2018
5. Evaluation of lines and spaces printing and general understanding of imaging with dark field low-n mask;Kovalevich;J Micro Nanolithogr MEMS MOEMS,2023