Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool-Reference-Cited by-同舟云学术

Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool

Published:2017-03-16 Issue:1 Volume:16 Page:013504
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Wang Yow-Gwo¹,Neureuther Andrew R.¹,Naulleau Patrick P.²

Affiliation:

1. University of California, Department of Electrical Engineering and Computer Sciences, Berkeley, California, United StatesbLawrence Berkeley National Laboratory, Center for X-ray Optics, Berkeley, California, United States

2. Lawrence Berkeley National Laboratory, Center for X-ray Optics, Berkeley, California, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference5 articles.

1. Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study

2. HyperLith: core lithography simulation package,2017

3. Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations

4. Best focus shift mechanism for thick masks

5. The study of phase effects in EUV mask pattern defects

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1. 先进节点图案化晶圆缺陷检测技术;Laser & Optoelectronics Progress;2023

2. Source performance metrics for EUV mask inspection;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-03-08

3. Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-05-16