Validity of the thin mask approximation in extreme ultraviolet mask roughness simulations
Author:
Publisher
The Optical Society
Reference7 articles.
1. Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
2. Effects of mask roughness and condenser scattering in EUVL systems
3. Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests
4. System-level line-edge roughness limits in extreme ultraviolet lithography
5. Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Cited by 8 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Extreme ultraviolet mask roughness effects in high numerical aperture lithography;Applied Optics;2018-03-01
2. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging;Applied Optics;2017-04-13
3. Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-03-16
4. Impact of noise sources and optical design on defect sensitivity for EUV actinic pattern inspection;SPIE Proceedings;2016-10-03
5. Extreme ultraviolet mask roughness: requirements, characterization, and modeling;SPIE Proceedings;2014-07-28
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