Relevance of mask-roughness-induced printed line-edge roughness in recent and future extreme-ultraviolet lithography tests
Author:
Publisher
The Optical Society
Reference13 articles.
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2. Extreme ultraviolet mask roughness effects in high numerical aperture lithography;Applied Optics;2018-03-01
3. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging;Applied Optics;2017-04-13
4. Aerial imaging study of the mask-induced line-width roughness of EUV lithography masks;Extreme Ultraviolet (EUV) Lithography VII;2016-03-18
5. Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement;SPIE Proceedings;2015-03-16
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