Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic-Reference-Cited by-同舟云学术

Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic

Published:2002 Issue:6 Volume:20 Page:2829
ISSN:0734-211X
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Naulleau Patrick,Goldberg Kenneth A.,Anderson Erik H.,Attwood David,Batson Phillip,Bokor Jeffrey,Denham Paul,Gullikson Eric,Harteneck Bruce,Hoef Brian,Jackson Keith,Olynick Deirdre,Rekawa Seno,Salmassi Farhad,Blaedel Ken,Chapman Henry,Hale Layton,Mirkarimi Paul,Soufli Regina,Spiller Eberhard,Sweeney Don,Taylor John,Walton Chris,O’Connell Donna,Tichenor Daniel,Gwyn Charles W.,Yan Pei-Yang,Zhang Guojing

Publisher

American Vacuum Society

Subject

General Engineering

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