Author:
Chkhalo N. I.,Durov K. V.,Nechay A. N.,Perekalov A. A.,Polkovnikov V. N.,Salashchenko N. N.
Reference39 articles.
1. G. E. Moore, Electronics 38, 114 (1965). https://doi.org/10.1109/jproc.1998.658762
2. K. Kim, U-In. Chung, Y. Park, J. Lee, J. Yeo, and D. Kim, Proc. SPIE 8326, 832605 (2012). https://doi.org/10.1117/12.920053
3. DUV Lithography Systems TWINSCAN NXT:2000i. https://www.asml.com/en/products/duv-lithography-systems/twinscan-nxt2000i.
4. M. Van de Kerkhof, H. Jasper, L. Levasier, R. Peeters, R. van Es, J.-W. Bosker, A. Zdravkov, E. Lenderink, F. Evangelista, P. Broman, B. Bilski, and T. Last, Proc. SPIE 10143, 101430D (2017). https://doi.org/10.1117/12.2258025
5. EUV Lithography Systems TWINSCAN NXE:3400B. https://www.asml.com/en/products/euv-lithography-systems.
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献