Effects of object roughness on partially coherent image formation
Author:
Publisher
The Optical Society
Subject
Atomic and Molecular Physics, and Optics
Reference6 articles.
1. Soft x-ray reduction lithography using multilayer mirrors
2. Fabrication and testing of optics for EUV projection lithography
3. Nonspecular x-ray scattering in a multilayer-coated imaging system
4. Effects of mask roughness and condenser scattering in EUVL systems
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1. Recovering effective amplitude and phase roughness of EUV masks;SPIE Proceedings;2013-09-23
2. Pupil shaping and coherence control in an EUV mask-imaging microscope;SPIE Proceedings;2013-09-20
3. Mathematical model for calculating speckle contrast through focus;Extreme Ultraviolet (EUV) Lithography IV;2013-04-01
4. Using the transport of intensity equation to predict mask-induced speckle through focus;SPIE Proceedings;2012-03-29
5. Mask roughness induced LER: geometric model at long correlation lengths;SPIE Proceedings;2011-03-17
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