Correlation method for the measure of mask-induced line-edge roughness in extreme ultraviolet lithography
Author:
Publisher
The Optical Society
Reference7 articles.
1. Line-edge roughness transfer function and its application to determining mask effects in EUV resist characterization
2. Effects of mask roughness and condenser scattering in EUVL systems
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4. System-level line-edge roughness limits in extreme ultraviolet lithography
5. Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic
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2. Extreme ultraviolet mask roughness effects in high numerical aperture lithography;Applied Optics;2018-03-01
3. Amplitude versus phase effects in extreme ultraviolet lithography mask scattering and imaging;Applied Optics;2017-04-13
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