Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic-Reference-Cited by-同舟云学术

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Status of EUV micro-exposure capabilities at the ALS using the 0.3-NA MET optic

Published:2004-05-20 Issue: Volume: Page:
ISSN:0277-786X
Container-title:SPIE Proceedings
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Author:

Naulleau Patrick,Goldberg Kenneth A.,Anderson Erik H.,Bradley Kevin,Delano Rene,Denham Paul,Gunion Bob,Harteneck Bruce,Hoef Brian,Huang Hanjing,Jackson Keith,Jones Gideon,Kemp Drew,Liddle James A.,Oort Ron,Rawlins Al,Rekawa Senajith,Salmassi Farhad,Tackaberry Ron,Chung Carl,Hale Layton,Phillion Don,Sommargren Gary,Taylor John

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SPIE

Cited by 84 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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4. Optical proximity correction for anamorphic extreme ultraviolet lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-08-19

5. Ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask;SPIE Proceedings;2016-05-10

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