1. EUV lithography performance for manufacturing: status and outlook;Alberto,2016
2. EUV progress toward HVM readiness;Britt,2016
3. Performance optimization of MOPA pre-pulse LPP light source;A.,2015
4. Status of EUV microexposure capabilities at the ALS using the 0.3-NA MET optic;P.,2004
5. The SEMATECH Berkeley MET: demonstration of 15-nm half-pitch in chemically amplified EUV resist and sensitivity of EUV resists at 6.x-nm;C.,2012