Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection-Reference-Cited by-同舟云学术

Impact of tool design on defect detection sensitivity in extreme ultraviolet actinic blank inspection

Published:2017-05-16 Issue:2 Volume:16 Page:023502
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Wang Yow-Gwo¹,Neureuther Andrew R.¹,Naulleau Patrick P.²

Affiliation:

1. University of California, Berkeley, Department of Electrical Engineering and Computer Sciences, Berkeley, California, United StatesbCenter for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California, United States

2. Center for X-ray Optics, Lawrence Berkeley National Laboratory, Berkeley, California, United States

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference11 articles.

1. Enhancing defect detection with Zernike phase contrast in EUV multilayer blank inspection

2. Inspection efficiency comparison between phase contrast and dark field microscopy for EUV actinic blank inspection;Wang,2016

3. Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool

4. EUV mask infrastructure readiness and gaps for TD and HVM

5. Understanding EUV mask blank surface roughness induced LWR and associated roughness requirement

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 先进节点图案化晶圆缺陷检测技术;Laser & Optoelectronics Progress;2023