Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study-Reference-Cited by-同舟云学术

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Enhancing native defect sensitivity for EUV actinic blank inspection: optimized pupil engineering and photon noise study

Published:2016-03-18 Issue: Volume: Page:
ISSN:0277-786X
Container-title:Extreme Ultraviolet (EUV) Lithography VII
language:
Short-container-title:

Author:

Wang Yow-Gwo¹,Neureuther Andrew¹,Naulleau Patrick²

Affiliation:

1. Univ. of California, Berkeley (United States)

2. Lawrence Berkeley National Lab. (United States)

Publisher

SPIE

Reference6 articles.

1. EUV mask infrastructure readiness and gaps for TD and HVM;Liang,2015

2. Enhancing Defect Detection with Zernike Phase Contrast in EUV Multilayer Blank Inspection;Wang,2015

3. Performance in practical use of actinic EUVL mask blank inspection;Yamane,2014

4. Phase-enhanced defect sensitivity for EUV mask inspection;Wang,2014

5. Actinic microscope for extreme ultraviolet lithography photomask inspection and review

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Performance of Extreme Ultraviolet Coherent Scattering Microscope;Journal of Nanoscience and Nanotechnology;2019-10-01

2. Impact of noise sources and optical design on defect detection sensitivity in extreme ultraviolet actinic pattern inspection tool;Journal of Micro/Nanolithography, MEMS, and MOEMS;2017-03-16

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