High-order distortion control using a computational prediction method for device overlay-Reference-Cited by-同舟云学术

High-order distortion control using a computational prediction method for device overlay

Published:2016-03-29 Issue:2 Volume:15 Page:021403
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Kang Young-Seog¹,Affentauschegg Cedric²,Mulkens Jan²,Kim Jang-Sun¹,Shin Ju-Hee¹,Kim Young-Ha¹,Nam Young-Sun¹,Choi Young-Sin¹,Ha Hunhwan¹,Lee Dong-Han¹,Lee Jae-il¹,Rizvi Umar²,Geh Bernd³,van der Heijden Rob²,Baselmans Jan²,Kwon Oh-Sung⁴

Affiliation:

1. SAMSUNG Electronics Co., Ltd., San #16, Banwol-Dong, Hwasung, Gyeonggi-Do, Republic of Korea

2. ASML Netherlands B.V., P.O. Box 324, 5500 AH Veldhoven, Netherlands

3. Carl Zeiss SMT Inc., c/o ASML Technology Development Center, 2650 West Geronimo Place Chandler, Arizona 85224, United States

4. ASML Korea Co., Ltd., 25, 5 Gil, Samsung 1 Ro, Hwasung-Si, Gyeonggi-do 445-170, Republic of Korea

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference17 articles.

1. Holistic optimization architecture enabling sub-14-nm projection lithography

2. Characterization and mitigation of overlay error on silicon wafers with nonuniform stress

3. Wafer to wafer overlay control algorithm implementation based on statistics

4. Overlay improvement methods with diffraction based overlay and integrated metrology

5. Analysis of overlay errors induced by exposure energy in negative tone development process for photolithography

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2. Distortion Detection of Lithographic Projection Lenses Based on Wavefront Measurement;Photonics;2023-02-04

3. On-scanner high-spatial-frequency overlay control using a distortion manipulator;Optical and EUV Nanolithography XXXV;2022-05-26

4. A novel projection lens manipulator for high frequent overlay tuning;Optical Microlithography XXXIII;2020-03-23

5. Review of scanning electron microscope-based overlay measurement beyond 3-nm node device;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-06-13