Affiliation:
1. Hitachi High-Technologies, Hitachinaka-shi, Ibaraki-ken
Publisher
SPIE-Intl Soc Optical Eng
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Cited by
13 articles.
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1. Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 5: Pattern Placement, Critical Dimension, and Edge-to-Edge Overlay;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-12-21
2. Applications of large field of view e-beam metrology to contour-based optical proximity correction modeling;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-10-19
3. Advanced high-voltage e-beam system combined with an enhanced D2DB for on-device overlay measurement;Metrology, Inspection, and Process Control XXXVII;2023-04-27
4. High-spatial frequency on-device overlay characterization using CD-SEM contours;Metrology, Inspection, and Process Control XXXVII;2023-04-27
5. Process window improvement for fin cut layer in self-aligned double-patterning process based on backscattered electron imaging;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-11-04